Alumina Target
Optinnavate Materials are specialists in the manufacture of ceramic sputtering targets for the Semiconductor Industry manufactured of
99.99% alumina.
Features of our sputtering targets:
- Controlled microstructures
- Very high purity, consistency, and uniformity
- Thermal conductivity that is twice that of sintered SiC
- Highly resistant to thermal shock
Optinnovate can produce and supply full range of ceramic sputtering targets and compound targets, including oxide sputtering targets, carbide sputtering targets, fluoride sputtering targets, sulfide sputtering targets and so on. The production technology of ceramic sputtering targets are hot press. From the selection of raw materials to the control of temperature, pressure and time of hot press sintering, we strictly follow the specific production process, thus the finished ceramic sputtering targets have the characteristics of high purity, high density, uniform surface color without spots and crack, the end user can obtain constant erosion rates and high pure and homogeneous thin films during PVD process.
Indium Gallium Zinc Oxide Sputtering Target
Purity: 99.99%;
Production Method: hot press sintering
Available dimensions:
Circular: Diameter = 3 mm;
Rectangular: Length = 3 mm.
Type of Bond: Indium, Elastomer.
Related Sputtering Materials:
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MnO2 sputtering target
TiN sputtering target
Si3N4 sputtering target
Al2O3 sputtering target
SiC sputtering target
Co2O3 sputtering target
AlN sputtering target
ITO sputtering target
VO2 sputtering target
SiO2 sputtering target
Fe2O3 sputtering target
MgO sputtering target
SnO2 sputtering target
CuO sputtering target
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MoO3 sputtering target
WO3 sputtering target
LiFePO4 sputtering target
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